Multi-step plasma etching process for development of highly photosensitive InSb mid-IR FPAs
- 등재 SCOPUS
- 발행기관 SPIE
- 발행년도 2014
- 총서유형 Journal
- URI http://www.dcollection.net/handler/ewha/000000134943
- ISBN 9781628410075
- 본문언어 영어
- Published As http://dx.doi.org/10.1117/12.2053215
초록/요약
AFM; Etching; FPA; Indium antimonide (InSb); Infrared (IR); Multi-step; Plasma; Raman spectroscopy
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