Plasmonic Periodic Nanodot Arrays via Laser Interference Lithography for Organic Photovoltaic Cells with > 10% Efficiency
- 주제(키워드) surface plasmon , metal nanodot array , laser interference lithography , organic photovoltaics
- 등재 SCIE, SCOPUS
- 발행기관 AMER CHEMICAL SOC
- 발행년도 2016
- 총서유형 Journal
- URI http://www.dcollection.net/handler/ewha/000000139745
- 본문언어 영어
- Published As http://dx.doi.org/10.1021/acsnano.6b05313
초록/요약
In this study, we demonstrate a viable and promising optical engineering technique enabling the development of high-performance plasmonic organic photovoltaic devices. Laser interference lithography was explored to fabricate metal nanodot (MND) arrays with elaborately controlled dot size as well as periodicity, allowing spectral overlap between the absorption range of the active layers and the surface plasmon band of MND arrays. MND arrays with,-,91 nm dot size and similar to 202 nm periodicity embedded in a poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) hole transport layer remarkably enhanced the average power conversion efficiency (PCE) from 7.52% up 10.11%, representing one the highest PCE and degree of enhancement (similar to 34.4%) levels compared to the pristine device among plasmonic organic photovoltaics reported to date. The plasmonic enhancement mechanism was investigated by both optical and electrical analyses using finite difference time domain simulation and conductive atomic force microscopy studies.
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