High Photoresponse in Conformally Grown Monolayer MoS2 on a Rugged Substrate
- 주제(키워드) MoS2 , large scale , conformal growth , metal-organic chemical vapor deposition , photoresponse
- 주제(기타) Nanoscience & Nanotechnology; Materials Science, Multidisciplinary
- 설명문(일반) [Tri Khoa Nguyen; Anh Duc Nguyen; Le, Chinh Tam; Ullah, Farman; Tahir, Zeeshan; Kim, Yong Soo] Univ Ulsan, Dept Phys, Ulsan 44610, South Korea; [Tri Khoa Nguyen; Anh Duc Nguyen; Le, Chinh Tam; Ullah, Farman; Tahir, Zeeshan; Kim, Yong Soo] Univ Ulsan, Energy Harvest Storage Res Ctr, Ulsan 44610, South Korea; [Koo, Kyo-in] Univ Ulsan, Dept Biomed Engn, Ulsan 44610, South Korea; [Kim, Eunah; Kim, Dong-Wook] Ewha Womans Univ, Dept Phys, Seoul 03760, South Korea; [Jang, Joon I.] Sogang Univ, Dept Phys, Seoul 04107, South Korea
- 등재 SCIE, SCOPUS
- 발행기관 AMER CHEMICAL SOC
- 발행년도 2018
- URI http://www.dcollection.net/handler/ewha/000000156287
- 본문언어 영어
- Published As http://dx.doi.org/10.1021/acsami.8b15673
초록/요약
Conformal growth of atomic-thick semiconductor layers on patterned substrates can boost up the performance of electronic and optoelectronic devices remarkably. However, conformal growth is a very challenging technological task, since the control of the growth processes requires utmost precision. Herein, we report on conformal growth and characterization of monolayer MoS2 on planar, microrugged, and nanorugged SiO2/Si substrates via metal-organic chemical vapor deposition. The continuous and conformal nature of monolayer MoS2, on the rugged surface was verified by high-resolution transmission electron microscopy. Strain effects were examined by photoluminescence (PL) and Raman spectroscopy. Interestingly, the photoresponsivity (similar to 254.5 mA/W) of as-grown MoS2 on the nanorugged substrate was 59 times larger than that of the planar sample (4.3 mA/W) under a small applied bias of 0.1 V. This value is record high when compared with all previous MoS2-based photocurrent generation under low or zero bias. Such enhancement in the photoresponsivity arises from a large active area for light-matter interaction and local strain for PL quenching, wherein the latter effect is the key factor and unique in the conformally grown monolayer on the nanorugged surface.
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